Excitonic properties of the polar faces of bulk ZnO after wet etching

Physica B: Condensed Matter

Volumn 340-342, Issue , 2003, Pages 210-215

  Fryar, J ^a   McGlynn, E ^a   Henry, M O ^a   Cafolla, A A ^b   Hanson, C J ^b  

^a DUBLIN CITY UNIVERSITY   (Ireland)

^b DUBLIN CITY UNIVERSITY   (Ireland)

Author keywords

AFM; Etch; Exciton; ZnO

Indexed keywords

ACETIC ACID; ATOMIC FORCE MICROSCOPY; ENERGY GAP; ETCHING; EXCITONS; HYDROCHLORIC ACID; LIGHT EMITTING DIODES; PHOSPHORIC ACID; PHOTOLUMINESCENCE; POLISHING; QUENCHING; SINGLE CRYSTALS; SPECTROSCOPIC ANALYSIS; SURFACE TOPOGRAPHY;

ACID ETCHANTS; REFLECTANCE SPECTROSCOPY;

ZINC OXIDE;

EID: 0347946924     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physb.2003.09.027     Document Type: Conference Paper

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