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Applied Physics A: Materials Science and Processing

Volumn 70, Issue 6, 2000, Pages 657-661

Pulsed laser deposition of tantalum pentoxide film

a UNIVERSITY COLLEGE LONDON (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; FILM GROWTH; NEODYMIUM LASERS; OXYGEN; PRESSURE EFFECTS; PULSED LASER APPLICATIONS; REFRACTIVE INDEX; SEMICONDUCTING SILICON; SUBSTRATES; TANTALUM COMPOUNDS; THERMAL EFFECTS; ULTRAVIOLET SPECTROSCOPY;

PULSED LASER DEPOSITION; TANTALUM PENTOXIDE FILM; ULTRAVIOLET IRRADIATION; ULTRAVIOLET SPECTROPHOTOMETRY;

THIN FILMS;

EID: 0034205148 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: None Document Type: Article

Times cited : (21)

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