Application of level set method in simulation of surface roughness in nanotechnologies

Thin Solid Films

Volumn 517, Issue 14, 2009, Pages 3954-3957

  Radmilovic Radjenovic M ^a   Radjenovic B ^a   Petrovic Z L J ^a  

^a UNIVERSITY OF BELGRADE   (Serbia)

Author keywords

Etching; Nanocomposite; Roughness

Indexed keywords

ETCH RATES; LEVEL SET METHODS; LIMITING FACTORS; NANO-COMPOSITE MATERIALS; PLASMA-INDUCED; ROUGHNESS;

ANISOTROPY; COMPOSITE MATERIALS; DROP BREAKUP; LEVEL MEASUREMENT; METAL ANALYSIS; NANOCOMPOSITES; NANOTECHNOLOGY; PLASMA ETCHING; PLASMAS; SURFACE PROPERTIES; SURFACE ROUGHNESS; SURFACE TREATMENT;

PHOTORESISTS;

EID: 65449159436     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.01.123     Document Type: Article

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