High density plasma etching of amorphous CoZrNb films for thin film magnetic devices

Thin Solid Films

Volumn 496, Issue 2, 2006, Pages 631-635

  Shin, Byul ^a   Park, Ik Hyun ^a   Lee, Jang Woo ^a   Kim, Tae Wan ^b   Chung, Chee Won ^a  

^a Inha University   (South Korea)

^b Samsung Advanced Institute of Technology (SAIT)   (South Korea)

Author keywords

CoZrNb; High density plasma etching; Magnetic devices

Indexed keywords

ANISOTROPY; COPPER COMPOUNDS; INDUCTIVELY COUPLED PLASMA; MAGNETIC DEVICES; MASKS; PLASMA ETCHING; REACTIVE ION ETCHING; THIN FILMS; TITANIUM NITRIDE;

ANISOTROPIC ETCHING; COZRNB; ETCHED FILMS; HIGH DENSITY PLASMA ETCCHING;

AMORPHOUS SILICON;

EID: 28044471820     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.08.292     Document Type: Article

References (13)

1. T. Takahashi, M. Yoneda, and M. Naoe Jpn. J. Appl. Phys. 28 1989 379
2. H. Yamada, T. Shimatsu, I. Watanabe, R. Tsuchiyama, H. Aoi, H. Muraoka, and Y. Nakamura J. Magn. Magn. Mater. 287 2005 486
3. H.W. Zhang, Y.L. Liu, and Z.Y. Zhing Vacuum 62 2001 1
4. M.J. Vasile, and C.J. Mogab J. Vac. Sci. Technol., A 4 1986 1841
5. R.C. Sousa, and P.P. Freitas IEEE Trans. Magn. 37 2001 1973
6. K. Nagahara, T. Mukai, N. Ishiwata, H. Hada, and S. Tahara Jpn. J. Appl. Phys. 42 2003 L499
7. B. Khamsehpour, C.D.W. Wilkinson, and J.N. Chapman Appl. Phys. Lett. 67 1995 3194
8. K.B. Jung, H. Cho, Y.B. Hahn, E.S. Lambers, S. Onishi, D. Johnson, A.T. Hurst, J.R. Childress, Y.D. Park, and S.J. Pearton J. Appl. Phys. 85 1999 4788
9. N. Matsui, K. Mashimo, A. Egami, A. Konishi, O. Okada, and T. Tsukada Vacuum 66 2002 479
10. F.C.M.J.M. van Delft, and J.B. Giesbers J. Nucl. Mater. 200 1993 366
11. K. Ichihara, and M. Hara Jpn. J. Appl. Phys. 36 1997 4874
12. M.S.P. Andriesse, T. Zijlstra, and E. van der Drift J. Vac. Sci. Technol., B 18 2000 3462
13. B. Shin, Y.S. Song, S.J. Park, T.W. Kim, and C.W. Chung Phys. Stat. Sol. (a) 201 2004 1644