Ion bombardment-induced enhancement of the properties of indium tin oxide films prepared by plasma-assisted reactive magnetron sputtering

Thin Solid Films

Volumn 517, Issue 16, 2009, Pages 4576-4582

  Dudek, M ^a   Amassian, A ^a   Zabeida, O ^a   Klemberg Sapieha, J E ^a   Martinu, L ^a  

^a ÉCOLE POLYTECHNIQUE DE MONTRÉAL   (Canada)

Author keywords

Electrical properties and measurements; Indium tin oxide; Ion bombardment; Optical coatings

Indexed keywords

ALLOY TARGETS; ELECTRICAL PROPERTIES AND MEASUREMENTS; FLEXIBLE PLASTIC SUBSTRATES; FREE FILMS; GROWING FILMS; HIGH TRANSPARENCIES; INDIUM TIN OXIDE; INDIUM TIN OXIDE FILMS; ITO FILMS; LOW RESISTIVITIES; PLASMA ASSISTED REACTIVE MAGNETRON SPUTTERING; RADIO-FREQUENCY POWER; REACTIVE MAGNETRON SPUTTERING; REACTIVE SPECIES; TIN-DOPED INDIUM OXIDES; TRANSPARENT CONDUCTING OXIDES;

CONDUCTING POLYMERS; ELECTRIC PROPERTIES; INDIUM; INDIUM ALLOYS; IONS; MAGNETRONS; MECHANICAL PROPERTIES; OPTICAL COATINGS; OPTICAL MATERIALS; ORGANIC LIGHT EMITTING DIODES (OLED); OXIDE FILMS; PHOTOLITHOGRAPHY; PLASMAS; STRESSES; SUBSTRATES; TIN; TIN ALLOYS; TIN OXIDES; TITANIUM COMPOUNDS;

ION BOMBARDMENT;

EID: 65149085167     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.01.012     Document Type: Article

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