Depth profiling of oxygen content of indium tin oxide fabricated by bias sputtering

Applied Surface Science

Volumn 113-114, Issue , 1997, Pages 408-411

  Honda, Shin Ichi ^a   Chihara, Koji ^a   Watamori, Michio ^a   Oura, Kenjiro ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Bias sputtering; Depth profiling; ITO films; Oxygen content

Indexed keywords

COMPOSITION; ELECTRIC PROPERTIES; FILMS; GLASS; ION BEAMS; ION BOMBARDMENT; OPTICAL PROPERTIES; OXYGEN; SPUTTERING; SUBSTRATES;

BIAS SPUTTERING; DEPTH PROFILING; HOT CATHODE PENNING DISCHARGE SPUTTERING; INDIUM TIN OXIDE;

OXIDES;

EID: 0031547429     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)00939-7     Document Type: Article

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