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Advanced Engineering Materials

Volumn 11, Issue 4, 2009, Pages 269-274

Interface reactions in ultrathin functional dielectric films

(4) Schmeißer, Dieter a Henkel, Karsten a Müller, Klaus a Tallarida, Massimo a

a BRANDENBURG UNIVERSITY OF TECHNOLOGY (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC MODELING; ATOMIC MODELS; COMPLEMENTARY METAL-OXIDE-SEMICONDUCTOR TECHNOLOGIES; FERROELECTRIC POLYMERS; HIGH-K DIELECTRIC MATERIALS; HIGH-K OXIDES; INTERFACE REACTIONS; NON-VOLATILE MEMORIES; SI-BASED; THIN-FILM MATERIALS; ULTRA-HIGH VACUUMS; ULTRA-VIOLET PHOTOELECTRON SPECTROSCOPIES;

ATOMIC SPECTROSCOPY; CHARGE COUPLED DEVICES; DIELECTRIC FILMS; FERROELECTRIC MATERIALS; FIELD EFFECT TRANSISTORS; HAFNIUM COMPOUNDS; METALLIC COMPOUNDS; MOS DEVICES; PHOTOELECTRON SPECTROSCOPY; POWER SUPPLY CIRCUITS; SEMICONDUCTING SILICON; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR MATERIALS; THIN FILM DEVICES; ULTRAHIGH VACUUM; ULTRATHIN FILMS; ULTRAVIOLET PHOTOELECTRON SPECTROSCOPY; ULTRAVIOLET SPECTROSCOPY; VACUUM APPLICATIONS;

FILM PREPARATION;

EID: 64749095636 PISSN: 14381656 EISSN: 15272648 Source Type: Journal
DOI: 10.1002/adem.200800297 Document Type: Article

Times cited : (4)

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