The Pr2O3/Si(0 0 1) interface

Materials Science in Semiconductor Processing

Volumn 6, Issue 1-3, 2003, Pages 59-70

  Schmeißer, Dieter ^a  

^a BRANDENBURG UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Electronic structure; High k dielectric; Photoelectron spectroscopy; Resonant

Indexed keywords

CHEMICAL BONDS; DIELECTRIC MATERIALS; ELECTRONIC STRUCTURE; PHOTOELECTRON SPECTROSCOPY; PRASEODYMIUM ALLOYS; ULTRATHIN FILMS;

NONDESTRUCTIVE DEPTH PROFILING;

CMOS INTEGRATED CIRCUITS;

EID: 0142186263     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1369-8001(03)00072-6     Document Type: Article

References (31)

1. Wilk G.D., Wallace R.M., Anthony J.M. J Appl Phys. 89:2001;5243.
2. Weldon MK, Queeney KT, Eng Jr J, Raghavachari K, Chabal YJ. The surface science of semiconductor processing: gate oxides in the ever-shrinking transistor. Surf Sci 2002;500:859 Ferrer S, Petroff Y. Surface science done at third generation synchrotron facilities. Surf Sci 2002;500:605.
3. Weldon MK, Queeney KT, Eng Jr J, Raghavachari K, Chabal YJ. The surface science of semiconductor processing: gate oxides in the ever-shrinking transistor. Surf Sci 2002;500:859 Ferrer S, Petroff Y. Surface science done at third generation synchrotron facilities. Surf Sci 2002;500:605.
4. Muraoka K. Appl Phys Lett. 80:2002;4516.
5. Hergenrother JR, et al. IEDM 2001.
6. Müssig HJ. 2002. private communication.
7. Batchelor D.R., Follath R., Schmeißer D. Nucl Instrum Methods Phys Res A. 467-468:2001;470.
8. Hoffmann P., Mikalo R.P., Schmeißer D. Solid-State Electron. 44:2000;837.
9. Hoffmann P, PhD thesis, TU-Cottbus, 2002.
10. Tu Y., Tersoff J. Phys Rev Lett. 89:2002;86102.
11. Lewerenz H.J., Aggour M., Murell C., Kanis M., Jungblut H., Jabubowicz J., Cox P.A., Campbell S.A., Hoffmann P., Schmeißer D. Journal of Electroanalytical Chemistry. 540:2003;3.
12. Hoffmann P., Schmeißer D. J Non-Crystalline Solids. 303:2002;6.
13. Hoffmann P., Schmeißer D., Roters G., Nenyei Z. Thin Solid Films. 428(1-2):2003;216.
14. Sieber N., Mantel B.F., Seyller Th., Ristein J., Ley L., Heller T., Batchelor D.R., Schmeißer D. Appl Phys Lett. 78:2001;1216.
15. Schmeißer D., Mikalo R.P., Hoffmann P., Seyller Th., Ley L., Lloyd Spetz A. Appl Surf Sci. 184:2001;342.
16. Mikalo R.P., Hoffmann P., Batchelor D.R., Schmeißer D., Lloyd Spetz A., Lundstroem I. Mater Sci Forum. 353-356:2001;219.
17. Schmeißer D, Irmscher K, Wagner G. Mater Sci Eng B, in press.
18. Krüger D, Schmeißer D, Melnik V, Kurps R, Yamamoto Y, Tillack B. Book of Abstracts, Kofu, 2002.
19. Osten HJ, et al. IEDM Technical Digest, 2000. p. 653.
20. Müssig H-.J., Dabrowski J., Ignatovich K., Liu J.P., Zavodinsky V., Osten H.J. Surf Sci. 504:2002;159.
21. Gunnarson O., Schönhammer K. Phys Rev B. 28:1983;4315.
22. Kotani A., Ogasawara H. J Electron Spectrosc Relat Phenom. 86:1997;65.
23. Ogasawara H., Kotani A., Potze R., Sawatzky G.A., Thole B.T. Phys Rev B. 44:1991;5465.
24. Schmeißer D, Müssig H-J. E-MRS 2002, submitted for publication.
25. Schmeißer D, Müssig H-J. ECOSS, in press.
26. Himpsel F.J., McFeely F.R.et al. Phys Rev B. 38:1988;6084.
27. Siegbahn K, Karlson L. In: Flügge S, editor. Handbuch der physik. Berlin: Springer; 1982.
28. Perkin Elmer Handbook.
29. Dabrowski J., Zavodinsky V., Fleszar A. Microelectron Reliability. 41:2001;1093.
30. Gmelin, Handbuch anorgan. chemie, Teil C1, 269.
31. Goryacko A., Muessig H.J., Krüger D.et al. J Vac Sci Technol A. 20:2002;1860.