Hot-wire chemical vapor deposition of silicon nanoparticles on fused silica

Thin Solid Films

Volumn 517, Issue 12, 2009, Pages 3481-3483

  Salivati, Navneethakrishnan ^a   An, Yong Q ^b   Downer, Michael C ^b   Ekerdt, John G ^a  

^a The University of Texas at Austin   (United States)

^b UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

Chemical vapor deposition; Hot wire deposition; Nanostructures; Scanning electron microscopy; Second harmonic generation; Silicon; Silicon dioxide; Surface passivation

Indexed keywords

A THERMALS; AMBIENT TEMPERATURES; AS-GROWN; BAND GAPS; DISILANE; HOT-WIRE CHEMICAL VAPOR DEPOSITIONS; HOT-WIRE DEPOSITION; QUANTUM CONFINEMENT EFFECTS; RECOMBINATION CENTERS; SECOND HARMONIC GENERATION; SILICON DIOXIDE; SILICON NANOPARTICLES; SILICON PARTICLES; SIZE DEPENDENTS; SIZE UNIFORMITIES; SURFACE PASSIVATION; THERMAL-CVD;

CARBON NANOTUBES; DANGLING BONDS; DEPOSITION; DETECTORS; FUSED SILICA; HARMONIC GENERATION; NANOPARTICLES; NONLINEAR OPTICS; NONMETALS; OXIDES; PASSIVATION; SCANNING; SCANNING ELECTRON MICROSCOPY; SILANES; SILICA; SILICON DETECTORS; VACUUM DEPOSITION; VAPORS; WIRE;

CHEMICAL VAPOR DEPOSITION;

EID: 64349098254     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.01.060     Document Type: Article

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