Ultraclean Two-Stage Aerosol Reactor for Production of Oxide-Passivated Silicon Nanoparticles for Novel Memory Devices

Journal of the Electrochemical Society

Volumn 148, Issue 5, 2001, Pages

  Ostraat, Michele L ^a   De Blauwe, Jan W ^b   Green, Martin L ^b   Bell, L Douglas ^c   Atwater, Harry A ^a   Flagan, Richard C ^a  

^a CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

^b AGERE SYSTEMS   (United States)

^c CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001452485     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1360210     Document Type: Article

References (8)

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