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Volumn 206, Issue 2, 2009, Pages 281-286
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Optical properties of MOCVD HfO 2 films
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Author keywords
[No Author keywords available]
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Indexed keywords
MOCVD;
NULL ELLIPSOMETRIES;
OPTICAL MODELS;
VERTICAL REACTORS;
CHEMICAL VAPOR DEPOSITION;
HAFNIUM;
OPTICAL PROPERTIES;
HAFNIUM COMPOUNDS;
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EID: 62549097272
PISSN: 18626300
EISSN: 18626319
Source Type: Journal
DOI: 10.1002/pssa.200824250 Document Type: Conference Paper |
Times cited : (15)
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References (22)
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