Accurate ellipsometric measurement of refractive index and thickness of ultrathin oxide film

Journal of the Electrochemical Society

Volumn 153, Issue 12, 2006, Pages

  Ayupov, B M ^a   Gritsenko, V A ^b   Wong, Hei ^c   Kim, C W ^d  

^a NIKOLAEV INSTITUTE OF INORGANIC CHEMISTRY   (Russian Federation)

^b INSTITUTE OF SEMICONDUCTOR PHYSICS   (Russian Federation)

^c CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^d Samsung Advanced Institute of Technology (SAIT)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANGLE MEASUREMENT; ANISOTROPY; ELLIPSOMETRY; ERROR ANALYSIS; OPTIMIZATION; PARAMETER ESTIMATION; REFRACTIVE INDEX; SEMICONDUCTING SILICON;

ELLIPSOMETRIC MEASUREMENT; SUBSTRATE PARAMETERS; ULTRATHIN DIELECTRIC FILMS; ULTRATHIN OXIDE FILMS;

ULTRATHIN FILMS;

EID: 33750815641     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2357717     Document Type: Article

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