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Applied Physics Letters

Volumn 86, Issue 21, 2005, Pages 1-3

Nanometer-scale crystallization of thin HfO2 films studied by HF-chemical etching

(5) Fujii, Shinji a,b Miyata, Noriyuki c Migita, Shinji c Horikawa, Tsuyoshi c Toriumi, Akira c,d

a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET (Japan)

b PANASONIC CORPORATION (Japan)

c NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

d UNIVERSITY OF TOKYO (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL STRUCTURE; CRYSTALLIZATION; ETCHING; FILM GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

ATOMIC LAYER DEPOSITION (ALD); BULK MATERIALS; NUCLEUS DENSITY; PHOTOELECTRON INTENSITIES;

THIN FILMS;

EID: 20844461810 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.1939073 Document Type: Article

Times cited : (21)

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