Chemical vapor deposition and characterization of hafnium oxide films

Journal of Physics and Chemistry of Solids

Volumn 69, Issue 2-3, 2008, Pages 685-687

  Smirnova, T P ^a,b   Yakovkina, L V ^a,b   Kitchai, V N ^a,b   Kaichev, V V ^c   Shubin, Yu V ^a   Morozova, N B ^a   Zherikova, K V ^a  

^a NIKOLAEV INSTITUTE OF INORGANIC CHEMISTRY   (Russian Federation)

^b TOMSK STATE UNIVERSITY   (Russian Federation)

^c BORESKOV INSTITUTE OF CATALYSIS   (Russian Federation)

Author keywords

A. Oxides; A. Thin films; B. Vapour deposition; C. Photoelectron spectroscopy

Indexed keywords

ELLIPSOMETRY; HAFNIUM COMPOUNDS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; THIN FILMS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTROPHYSICAL METHODS; HAFNIUM SILICIDE;

OXIDE FILMS;

EID: 38749135831     PISSN: 00223697     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jpcs.2007.07.123     Document Type: Article

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