Supercritical fluid deposition of conformal SRTI O3 films with composition uniformity in nanocontact holes

Electrochemical and Solid-State Letters

Volumn 12, Issue 5, 2009, Pages

  Lee, J H ^a   Son, J Y ^b   Lee, Han Bo Ram ^b   Lee, Heung Soon ^b   Ma, D J ^a   Lee, C S ^a   Kim, Hyungjun ^b  

^a Samsung Advanced Institute of Technology (SAIT)   (South Korea)

^b Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; EFFLUENT TREATMENT; OZONE WATER TREATMENT; RANDOM ACCESS STORAGE; REAL TIME SYSTEMS; STOICHIOMETRY; STRONTIUM COMPOUNDS; SUPERCRITICAL FLUIDS;

ATOMIC-LAYER DEPOSITIONS; CAPACITOR DIELECTRICS; COMPOSITIONAL UNIFORMITIES; CONFORMALITY; DYNAMIC RANDOM ACCESS MEMORIES; HIGH DIELECTRIC CONSTANTS; NANO CONTACTS; NANO SIZES; NANO-SCALE; SUPERCRITICAL FLUID DEPOSITIONS;

CHEMICAL VAPOR DEPOSITION;

EID: 62549088283     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3092891     Document Type: Article

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