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Journal of the Electrochemical Society

Volumn 152, Issue 6, 2005, Pages

Study on the step coverage of metallorganic chemical vapor deposited TiO2 and SrTiO3 thin films

(6) No, Sang Yong a Oh, Jin Ho a Jeon, Chung Bae a,b Schindler, Mathias a Hwang, Cheol Seong a Kim, Hyeong Joon a

a Seoul National University (South Korea)

b RWTH AACHEN UNIVERSITY (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MOLECULAR STRUCTURE; STRONTIUM COMPOUNDS; THERMAL EFFECTS; THIN FILMS;

PRECURSORS; SLOPES; STERIC HINDRANCE; THIN FILM DEPOSITION;

TITANIUM DIOXIDE;

EID: 22544431668 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.1915287 Document Type: Article

Times cited : (14)

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