Cation composition control of MOCVD (Ba,Sr)TiO3 thin films along the capacitor hole

Journal of the Electrochemical Society

Volumn 149, Issue 10, 2002, Pages

  Hwang, Cheol Seong ^a   No, Sang Yong ^a   Park, Jaehoo ^a   Kim, Hyeong Joon ^a   Cho, Ho Jin ^b   Han, Young Ki ^c   Oh, Ki Young ^c  

^a Seoul National University   (South Korea)

^b Hynix Semiconductor Inc   (South Korea)

^c Jusung Engineering Company Limited   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITORS; COMPOSITION; DEPOSITION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; POSITIVE IONS; STOICHIOMETRY;

CAPACITOR HOLES;

THIN FILMS;

EID: 0036805321     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1506305     Document Type: Article

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