Morphological and compositional effects of FIB nanopatterning of multilayer metal/semiconducting devices

Physica E: Low-Dimensional Systems and Nanostructures

Volumn 41, Issue 4, 2009, Pages 734-738

  Taurino, A ^a   Catalano, M ^a   Lomascolo, M ^a   Persano, A ^a   Convertino, A ^a   Cerri, L ^a  

^a CNR   (Italy)

Author keywords

EDS; FIB nanopatterning; HREM; Metal semiconductor multilayer; Morphological and analytical investigations; TEM

Indexed keywords

CHEMICAL ANALYSIS; ELECTRIC CONDUCTIVITY; ELECTRON MICROSCOPES; ELECTRON MICROSCOPY; EXPLOSIVE ACTUATED DEVICES; FOCUSED ION BEAMS; INDIUM ARSENIDE; ION BEAMS; ION BOMBARDMENT; IONS; MILLING (MACHINING); MULTILAYERS; QUANTUM ELECTRONICS; REAL TIME SYSTEMS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR MATERIALS; SEMICONDUCTOR QUANTUM DOTS;

EDS; FIB NANOPATTERNING; HREM; METAL-SEMICONDUCTOR MULTILAYER; MORPHOLOGICAL AND ANALYTICAL INVESTIGATIONS; TEM;

TRANSMISSION ELECTRON MICROSCOPY;

EID: 60349089518     PISSN: 13869477     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physe.2008.12.001     Document Type: Article

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