Focused ion beam lithography for two dimensional array structures for photonic applications

Microelectronic Engineering

Volumn 78-79, Issue 1-4, 2005, Pages 11-15

  Cabrini, S ^a   Carpentiero, A ^a   Kumar, R ^a   Businaro, L ^a   Candeloro, P ^a   Prasciolu, M ^a   Gosparini, A ^a   Andreani, C ^b   De Vittorio, M ^c   Stomeo, T ^c   Di Fabrizio, E ^a  

^a LABORATORIO TASC   (Italy)

^b UNIVERSITY OF PAVIA   (Italy)

^c NATIONAL NANOTECHNOLOGY LABORATORY   (Italy)

Author keywords

Focused ion beam; GaAs; Photonic crystal; Resistless lithography

Indexed keywords

ALUMINUM ALLOYS; ARRAYS; ARSENIC; CRYSTALS; FLUORINE; LASER PULSES; OPTICAL DEVICES; PHONONS; PHOTOLUMINESCENCE; SEMICONDUCTING GALLIUM ARSENIDE; SILICON ALLOYS; SODIUM ALLOYS;

ARRAY STRUCTURES; FOCUSED ION BEAMS; PHOTONIC CRYSTALS; RESISTLESS LITHOGRAPHY;

ION BEAM LITHOGRAPHY;

EID: 20244379380     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2004.12.006     Document Type: Conference Paper

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