Two-step resist-development process of hydrogen silsesquioxane for high-density electron-beam nanopatterning

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 1, 2009, Pages 188-192

  Lee, Hyo Sung ^a   Wi, Jung Sub ^a   Nam, Sung Wook ^a   Kim, Hyun Mi ^a   Kim, Ki Bum ^a  

^a Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

DIESEL ENGINES; HYDROFLUORIC ACID; HYDROGEN; PHOTOELECTRON SPECTROSCOPY;

BOND STRUCTURES; DEVELOPMENT METHODS; DEVELOPMENT PROCESS; DEVELOPMENT TIME; DOT PATTERNS; ELECTRON-BEAM; ELECTRON-BEAM EXPOSURES; HIGH DENSITIES; HYDROGEN-SILSESQUIOXANE; NANO-PATTERNING; NANOMETER-SCALE PATTERNS; REMOVAL PROCESS; TETRAMETHYLAMMONIUM; X-RAY PHOTOELECTRON SPECTROSCOPIES;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 59949102778     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3049482     Document Type: Article

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