Influence of temperature on HSQ electron-beam lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 6, 2007, Pages 2045-2048

  Haffner M ^a   Haug, A ^a   Heeren, A ^a   Fleischer, M ^a   Peisert, H ^a   Chasse T ^a   Kern, D P ^a  

^a UNIVERSITY OF TÜBINGEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CORRELATION METHODS; CROSSLINKING; ELECTRON BEAMS; HYDROGEN; THERMAL EFFECTS;

HYDROGEN SILSESQUIOXANE (HSQ); LOW TEMPERATURES; ROOM TEMPERATURE;

ELECTRON BEAM LITHOGRAPHY;

EID: 37149029101     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2794324     Document Type: Article

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