An optimal high contrast e-beam lithography process for the patterning of dense fin networks

Materials Science and Engineering C

Volumn 26, Issue 5-7, 2006, Pages 893-897

  Fruleux Cornu, F ^a   Penaud, J ^a   Dubois, E ^a   Francois M ^a   Muller, M ^a  

^a INSTITUT D ELECTRONIQUE   (France)

Author keywords

DG transistors; E beam lithography; HSQ; TMAH

Indexed keywords

AMMONIUM COMPOUNDS; CMOS INTEGRATED CIRCUITS; LEAKAGE CURRENTS; OPTICAL PROPERTIES; SCANNING ELECTRON MICROSCOPY; TRANSISTORS;

DG TRANSISTORS; HSQ; TMAH;

ELECTRON BEAM LITHOGRAPHY;

EID: 33747113063     PISSN: 09284931     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.msec.2005.09.017     Document Type: Article

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