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Volumn 22, Issue 6, 2004, Pages 3497-3502
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Nonaqueous development of silsesquioxane electron beam resist
a b a |
Author keywords
[No Author keywords available]
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Indexed keywords
AQUEOUS BASE PROCESSING;
HIGH-RESOLUTION PATTERNS;
HYDROGEN SILSESQUIOXANE (HSQ);
MECHANICAL STABILITY;
ATOMIC FORCE MICROSCOPY;
CONDENSATION;
CROSSLINKING;
DISSOLUTION;
ELECTRON BEAMS;
MICROELECTRONICS;
OPTICAL RESOLVING POWER;
ORGANIC SOLVENTS;
SCANNING ELECTRON MICROSCOPY;
SOLUTIONS;
THERMODYNAMICS;
DIELECTRIC MATERIALS;
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EID: 13244259602
PISSN: 10711023
EISSN: None
Source Type: Journal
DOI: 10.1116/1.1825014 Document Type: Conference Paper |
Times cited : (28)
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References (10)
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