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Volumn 22, Issue 6, 2004, Pages 3497-3502

Nonaqueous development of silsesquioxane electron beam resist

Author keywords

[No Author keywords available]

Indexed keywords

AQUEOUS BASE PROCESSING; HIGH-RESOLUTION PATTERNS; HYDROGEN SILSESQUIOXANE (HSQ); MECHANICAL STABILITY;

EID: 13244259602     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1825014     Document Type: Conference Paper
Times cited : (28)

References (10)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.