Oxygen incorporation in thin films of In2O3:Sn prepared by radio frequency sputtering

Journal of Applied Physics

Volumn 88, Issue 5, 2000, Pages 2437-2442

  Mergel, D ^a   Stass, W ^a   Ehl, G ^a   Barthel, D ^a  

^a UNIVERSITY OF DUISBURG ESSEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000531083     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1287603     Document Type: Article

References (29)

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