Tin-doped indium oxide thin film deposited on organic substrate using oxygen ion beam assisted deposition

Surface and Coatings Technology

Volumn 131, Issue 1-3, 2000, Pages 196-200

  Bae, J W ^a   Kim, H J ^a   Kim, J S ^a   Lee, Y H ^a   Lee, N E ^a   Yeom, G Y ^a   Ko, Y W ^b  

^a Sungkyunkwan University   (South Korea)

^b Hynix Semiconductor Inc   (South Korea)

Author keywords

IBAD; ITO; Oxygen ion; Oxygen radical

Indexed keywords

DEPOSITION; ELECTRICITY; FILM; RESISTIVITY;

EID: 0034536499     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)00826-4     Document Type: Conference Paper

References (12)