The role of oxygen and hydrogen partial pressures on structural and optical properties of ITO films deposited by reactive rf-magnetron sputtering

Applied Surface Science

Volumn 253, Issue 14, 2007, Pages 6068-6073

  Das, Rajesh ^a   Adhikary, Koel ^a   Ray, Swati ^a  

^a DEPARTMENT OF MATERIALS SCIENCE   (India)

Author keywords

Crystallographic planes; First Fourier pattern; ITO film; Reactive sputtering; rf Magnetron sputtering; X ray diffraction spectra

Indexed keywords

DEPOSITION; HYDROGEN; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; OXYGEN; PRESSURE EFFECTS; REACTIVE SPUTTERING; X RAY DIFFRACTION;

CRYSTALLOGRAPHIC PLANES; FIRST FOURIER PATTERN; ITO FILM; RF-MAGNETRON SPUTTERING; X-RAY DIFFRACTION SPECTRA;

THIN FILMS;

EID: 34247159064     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.01.107     Document Type: Article

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