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1
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9544252972
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Non-volatile memory technologies: Emerging concepts and new materials
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R. Bez and A. Pirovano, "Non-volatile memory technologies: Emerging concepts and new materials," Mat. Sci. Semic. Process., vol. 7, pp. 349-355, 2004.
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Mat. Sci. Semic. Process
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Bez, R.1
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2
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0842331309
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Scaling analysis of phase-change memory technology
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A. Pirovano, A. L. Lacaita, A. Benvenuti, F. Pellizzer, S. Hudgens, and R. Bez, "Scaling analysis of phase-change memory technology," in IEDM Tech. Dig., 2003, p. 699.
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IEDM Tech. Dig
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Pirovano, A.1
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3
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33751032346
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Chalcogenide phase change memory: Scalable NVM for the next decade?
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Proc. IEEE 21st NVSMW
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Bez, R.1
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4
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11144230051
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Reliability study of phase-change nonvolatile memories
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A. Pirovano, A. Redaelli, F. Pellizzer, F. Ottogalli, M. Tosi, D. Ielmini, A. L. Lacaita, and R. Bez, "Reliability study of phase-change nonvolatile memories," IEEE Trans. Dev. Mater. Rel., vol. 4, p. 422, 2004.
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49549091783
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F. Bedeschi, R. Fackenthal, C. Resta, E. M. Donze, M. Jagasivamani, E. Buda, F. Pellizzer, D. Chow, A. Cabrini, G. M. A. Calvi, R. Faravelli, A. Fantini, G. Torelli, D. Mills, R. Gastaldi, and G. Casagrande, "A multi-level-cell bipolar-selected phase-change memory," in Proc. ISSCC, Dig. Tech. Papers, 2008, pp. 428-429.
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Mills, D.14
Gastaldi, R.15
Casagrande, G.16
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6
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0034451875
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Total dose radiation response and high temperature imprint characteristics of chalcogenide based RAM resistor elements
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Dec
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S. Bernacki, K. Hunt, S. Tyson, S. Hudgens, B. Pashmakov, and W. Czubatyj, "Total dose radiation response and high temperature imprint characteristics of chalcogenide based RAM resistor elements," IEEE Trans. Nucl. Sci., vol. 47, no. 6, pp. 2528-2533, Dec. 2000.
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Dec
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J. D. Maimon, K. Hunt, L. Burcin, and J. Rodgers, "Chalcogenide memory arrays: Characterization and radiation effects," IEEE Trans. Nucl. Sci., vol. 50, no. 6, pp. 1878-1884, Dec. 2003.
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Maimon, J.D.1
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Mar
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J. D. Maimon, K. Hunt, J. Rodgers, L. Burcin, and K. Knowles, "Results of radiation effects on a chalcogenide non-volatile memory array," in Proc. IEEE Aerospace Conf., Mar. 2004, vol. 4, pp. 2306-2315.
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9
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53349171479
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Total ionizing dose effects on 4 Mbit phase change memory arrays
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to be published
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A. Gasperin, N. Wrachien, A. Paccagnella, F. Ottogalli, U. Corda, P. Fuochi, and M. Lavalle, "Total ionizing dose effects on 4 Mbit phase change memory arrays," IEEE Trans. Nucl. Sci., to be published.
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IEEE Trans. Nucl. Sci
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Gasperin, A.1
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Lavalle, M.7
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10
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34548814469
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A 90 nm 1.8 V 512 Mb diode-switch PRAM with 266 MB/s read throughput
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K. J. Lee, B. H. Cho, W. Y. Cho, S. Kang, B. G. Choi, H. R. Oh, C. S. Lee, H. J. Kim, J. M. Park, Q. Wang, M. H. Park, Y. H. Ro, J. Y. Choi, K. S. Kim, Y. R. Kim, I. C. Shin, K. W. Lim, H. K. Cho, C. H. Choi, W. R. Chung, D. E. Kim, K. S. Yu, G. T. Jeong, H. S. Jeong, C. K. Kwak, C. H. Kim, and K. Kim, "A 90 nm 1.8 V 512 Mb diode-switch PRAM with 266 MB/s read throughput," in Proc. ISSCC, Dig. Tech. Papers, 2007, pp. 472-473.
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Lee, K.J.1
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Kang, S.4
Choi, B.G.5
Oh, H.R.6
Lee, C.S.7
Kim, H.J.8
Park, J.M.9
Wang, Q.10
Park, M.H.11
Ro, Y.H.12
Choi, J.Y.13
Kim, K.S.14
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Shin, I.C.16
Lim, K.W.17
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Yu, K.S.22
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Jeong, H.S.24
Kwak, C.K.25
Kim, C.H.26
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11
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41149134446
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A 90 nm phase change memory technology for stand-alone non-volatile memory applications
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F. Pellizzer, A. Benvenuti, B. Gleixner, Y. Kim, B. Johnson, M. Magistretti, T. Marangon, A. Pirovano, R. Bez, and G. Atwood, "A 90 nm phase change memory technology for stand-alone non-volatile memory applications," in Proc. Symp. VLSI Technology, 2006, pp. 122-123.
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12
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20244387716
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4-Mb MOSFET-selected phase-change memory experimental chip
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F. Bedeschi, R. Bez, C. Boffino, E. Bonizzoni, Buda, G. Casagrande, L. Costa, M. Ferraro, R. Gastaldi, O. Khouri, F. Ottogalli, F. Pellizzer, A. Pirovano, C. Resta, G. Torelli, and M. Tosi, "4-Mb MOSFET-selected phase-change memory experimental chip," in Proc. IEEE ESSCIRC, 2004, p. 207.
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Bedeschi, F.1
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Ottogalli, F.11
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Pirovano, A.13
Resta, C.14
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Tosi, M.16
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13
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22544464192
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4-Mb MOSFET-selected μ trench phase-change memory experimental chip
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F. Bedeschi, R. Bez, C. Boffino, E. Bonizzoni, E. C. Buda, G. Casagrande, L. Costa, M. Ferraro, R. Gastaldi, O. Khouri, F. Ottogalli, F. Pellizzer, A. Pirovano, C. Resta, G. Torelli, and M. Tosi, "4-Mb MOSFET-selected μ trench phase-change memory experimental chip," IEEE J. Solid-State Circuits, vol. 40, p. 1557, 2005.
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Costa, L.7
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Khouri, O.10
Ottogalli, F.11
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Pirovano, A.13
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Torelli, G.15
Tosi, M.16
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14
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An 8 Mb demonstrator for high-density 1.8 V phase-change memories
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F. Bedeschi, C. Resta, O. Khouri, E. Buda, L. Costa, M. Ferraro, F. Pellizzer, F. Ottogalli, A. Pirovano, M. Tosi, R. Bez, R. Gastaldi, and G. Casagrande, "An 8 Mb demonstrator for high-density 1.8 V phase-change memories," in Proc. VLSI Circuits Dig. Tech. Papers, 2004, p. 442.
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15
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4544229593
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Novel μ-trench phase-change memory cell for embedded and stand-alone non-volatile memory applications
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F. Pellizzer, A. Pirovano, F. Ottogalli, M. Magistretti, M. Scaravaggi, P. Zuliani, M. Tosi, A. Benvenuti, P. Besana, S. Cadeo, T. Marangon, R. Morandi, R. Piva, A. Spandre, R. Zonca, A. Modelli, E. Varesi, T. Lowrey, A. Lacaita, G. Casagrande, P. Cappelletti, and R. Bez, "Novel μ-trench phase-change memory cell for embedded and stand-alone non-volatile memory applications," in Proc. VLSI Tech. Dig., 2004, p. 18.
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16
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1642268448
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Total dose effects in MOS devices
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J. Schwank, "Total dose effects in MOS devices," presented at the IEEE NSREC Short Courses, 2002.
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IEEE NSREC Short Courses
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Schwank, J.1
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17
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85066792230
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Radiation response and reliability of oxide used in advanced processes
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presented at the
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A. Paccagnella and A. Cester, "Radiation response and reliability of oxide used in advanced processes," presented at the IEEE NSREC Short Courses, 2003.
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IEEE NSREC Short Courses
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Paccagnella, A.1
Cester, A.2
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18
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0036952546
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Radiation hardness perspectives for the design of analog detector readout circuits in the 0.18-μm CMOS generation
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M. Manghisoni, L. Ratti, V. Re, and V. Speziali, "Radiation hardness perspectives for the design of analog detector readout circuits in the 0.18-μm CMOS generation," IEEE Trans. Nucl. Sci., vol. 49, no. 6, pp. 2902-2909, Dec. 2002.
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Radiation-induced edge effects in deep submicron CMOS transistor
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Challenges in hardening technologies using shallow-trench isolation
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M. R. Shaneyfelt, P. E. Dodd, P. E. B. L. Draper, and R. S. Flores, "Challenges in hardening technologies using shallow-trench isolation," IEEE Trans. Nucl. Sci., vol. 45, no. 6, pp. 2584-2592, Dec. 1998.
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Nonuniform total-dose-induced charge distribution in shallow-trench isolation oxide
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Low-field amorphous state resistance and threshold voltage drift in chalcogenide materials
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A. Pirovano, A. L. Lacaita, F. Pellizzer, S. A. Kostylev, A. Benvenuti, and R. Bez, "Low-field amorphous state resistance and threshold voltage drift in chalcogenide materials," IEEE Trans. Electron. Devices, vol. 51, p. 714, 2004.
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S. Privitera, C. Bongiorno, E. Rimini, and R. Zonca, "Crystal nucleation and growth processes in Ge2Sb2Te5," Appl. Phys. Lett., vol. 80, p. 4448, 2004.
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8344227517
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Physics and hardness assurance for bipolar technologies
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presented at the
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R. D. Schrimpf, "Physics and hardness assurance for bipolar technologies," presented at the IEEE NSREC Short Courses, 2001.
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IEEE NSREC Short Courses
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Schrimpf, R.D.1
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