-
1
-
-
17944387744
-
Layout techniques to enhance the radiation tolerance of standard CMOS technologies demonstrated on a pixel detector readout chip
-
W. Snoeys et al., "Layout techniques to enhance the radiation tolerance of standard CMOS technologies demonstrated on a pixel detector readout chip," Nucl. Instr. Meth., vol. A 439, pp. 349-360, 2000.
-
(2000)
Nucl. Instr. Meth.
, vol.A 439
, pp. 349-360
-
-
Snoeys, W.1
-
2
-
-
0035366539
-
Front-end electronics for pixel sensors
-
P. F. Manfredi and M. Manghisoni, "Front-end electronics for pixel sensors," Nucl. Instr. Meth., vol. A465, pp. 140-147, 2001.
-
(2001)
Nucl. Instr. Meth.
, vol.A465
, pp. 140-147
-
-
Manfredi, P.F.1
Manghisoni, M.2
-
3
-
-
0033311541
-
Radiation tolerant VLSI circuits in standard deep submicron CMOS technologies for the LHC experiments: Practical design aspects
-
Aug
-
G. Anelli et al., "Radiation tolerant VLSI circuits in standard deep submicron CMOS technologies for the LHC experiments: Practical design aspects," IEEE Trans. Nucl. Sci., vol. 45, pp. 1690-1696, Aug 1999.
-
(1999)
IEEE Trans. Nucl. Sci.
, vol.45
, pp. 1690-1696
-
-
Anelli, G.1
-
4
-
-
0035148012
-
Noise characterization of a 0.25 μm CMOS technology for the LHC experiments
-
_, "Noise characterization of a 0.25 μm CMOS technology for the LHC experiments," Nucl. Instr. Meth., vol. A457, pp. 361-368, 2001.
-
(2001)
Nucl. Instr. Meth.
, vol.A457
, pp. 361-368
-
-
-
5
-
-
0035500706
-
FPIX2: A radiation-hard pixel readout chip for BTeV
-
D. C. Christian et al., "FPIX2: A radiation-hard pixel readout chip for BTeV," Nucl. Instr. Meth., vol. A473, pp. 152-156, 2001.
-
(2001)
Nucl. Instr. Meth.
, vol.A473
, pp. 152-156
-
-
Christian, D.C.1
-
6
-
-
0035500980
-
An introduction to deep submicron CMOS for vertex applications
-
M. C. Campbell et al., "An introduction to deep submicron CMOS for vertex applications," Nucl. Instr. Meth., vol. A473, pp. 140-145, 2001.
-
(2001)
Nucl. Instr. Meth.
, vol.A473
, pp. 140-145
-
-
Campbell, M.C.1
-
7
-
-
0012599838
-
Resolution limits achievable with CMOS front-end in X and γ-ray analysis with semiconductor detectors
-
Schloss Elmau, Germany, June 23-27
-
P. F. Manfredi et al., "Resolution limits achievable with CMOS front-end in X and γ-ray analysis with semiconductor detectors," in Proc. 9th Eur. Symp. Semiconductor Detectors, Schloss Elmau, Germany, June 23-27, 2002.
-
(2002)
Proc. 9th Eur. Symp. Semiconductor Detectors
-
-
Manfredi, P.F.1
-
9
-
-
0036702980
-
A new NMOS layout structure for radiation tolerance
-
Aug.
-
W. J. Snoeys, T. A. P. Gutierrez, and G. Anelli, "A new NMOS layout structure for radiation tolerance," IEEE Trans. Nucl. Sci., pp. 1829-1833, Aug. 2002.
-
(2002)
IEEE Trans. Nucl. Sci.
, pp. 1829-1833
-
-
Snoeys, W.J.1
Gutierrez, T.A.P.2
Anelli, G.3
-
10
-
-
0036703088
-
Submicron CMOS technologies for low-noise analog front-end circuits
-
Aug.
-
M. Manghisoni et al., "Submicron CMOS technologies for low-noise analog front-end circuits," IEEE Trans. Nucl. Sci., pp. 1783-1790, Aug., 2002.
-
(2002)
IEEE Trans. Nucl. Sci.
, pp. 1783-1790
-
-
Manghisoni, M.1
-
11
-
-
0003360696
-
Noise behavior under γ irradiation of 0.35 μm CMOS transistors
-
Louvain-la-Neuve, Belgium, Sept 11-13
-
_, "Noise behavior under γ irradiation of 0.35 μm CMOS transistors," in Proc. of the RADECS 2000 Workshop, Louvain-la-Neuve, Belgium, Sept 11-13, 2000, pp. 126-131.
-
(2000)
Proc. of the RADECS 2000 Workshop
, pp. 126-131
-
-
-
12
-
-
0035305322
-
Experimental studies of the noise properties of a deep submicron CMOS process
-
_, "Experimental studies of the noise properties of a deep submicron CMOS process," Nucl. Instr. Meth., vol. A461, pp. 537-539, 2001.
-
(2001)
Nucl. Instr. Meth.
, vol.A461
, pp. 537-539
-
-
-
13
-
-
0012509180
-
Radiation tolerance of a 0.18 μm CMOS process
-
Villa Olmo, Como, Oct 15-19
-
_, "Radiation tolerance of a 0.18 μm CMOS process," in Proc. 7th Int. Conf. Advanced Technology and Particle Physics, Villa Olmo, Como, Oct 15-19, 2001.
-
(2001)
Proc. 7th Int. Conf. Advanced Technology and Particle Physics
-
-
-
15
-
-
0028547704
-
1/f noise and radiation effects in MOS devices
-
Nov.
-
D. M. Fleetwood, T. L. Meisenheimer, and J. H. Scofield, "1/f noise and radiation effects in MOS devices," IEEE Trans. Electron Devices, vol. 41, pp. 1953-1964, Nov. 1994.
-
(1994)
IEEE Trans. Electron Devices
, vol.41
, pp. 1953-1964
-
-
Fleetwood, D.M.1
Meisenheimer, T.L.2
Scofield, J.H.3
-
17
-
-
0035428655
-
Experimental study and modeling of the white noise sources in submicron P and N-MOSFETS
-
Aug.
-
V. Re et al., "Experimental study and modeling of the white noise sources in submicron P and N-MOSFETS," IEEE Trans. Nucl. Sci., vol. 48, pp. 1577-1586, Aug. 2001.
-
(2001)
IEEE Trans. Nucl. Sci.
, vol.48
, pp. 1577-1586
-
-
Re, V.1
-
18
-
-
0026376339
-
1/f noise in n- and p-channel MOS devices through irradiation and annealing
-
Dec.
-
T. L. Meisenheimer et al., "1/f noise in n- and p-channel MOS devices through irradiation and annealing," IEEE Trans. Nucl. Sci., vol. 38, pp. 1297-1303, Dec. 1991.
-
(1991)
IEEE Trans. Nucl. Sci.
, vol.38
, pp. 1297-1303
-
-
Meisenheimer, T.L.1
-
19
-
-
0028447728
-
Advanced qualification techniques
-
June
-
P. S. Winokur et al., "Advanced qualification techniques," IEEE Trans. Nucl. Sci., vol. 41, pp. 538-548, June 1994.
-
(1994)
IEEE Trans. Nucl. Sci.
, vol.41
, pp. 538-548
-
-
Winokur, P.S.1
-
20
-
-
0002273701
-
Total close and single event effect (SEE) in a 0.25 μm CMOS technology
-
Rome, Italy, Sept
-
F. Faccio et al., "Total close and single event effect (SEE) in a 0.25 μm CMOS technology," in Proc. 4th Workshop Electronics for LHC Experiments, LEB98, Rome, Italy, Sept 1998, pp. 105-113.
-
(1998)
Proc. 4th Workshop Electronics for LHC Experiments, LEB98
, pp. 105-113
-
-
Faccio, F.1
|