Analysis of periodic Mo/Si multilayers: Influence of the Mo thickness

Surface Science

Volumn 603, Issue 2, 2009, Pages 407-411

  Maury, H ^a   Andre J M ^a   Le Guen, K ^a   Mahne, N ^b   Giglia, A ^b   Nannarone, S ^b   Bridou, F ^c   Delmotte, F ^c   Jonnard, P ^a  

^a SORBONNE UNIVERSITÉ   (France)

^b LABORATORIO TASC   (Italy)

^c CNRS   (France)

Author keywords

Crystalline amorphous interfaces; Molybdenum; Roughness; Silicon; Superlattices; X ray emission; X ray reflection; X ray scattering

Indexed keywords

ATOMIC SPECTROSCOPY; CRYSTALLINE MATERIALS; ELECTROMAGNETIC WAVE EMISSION; EMISSION SPECTROSCOPY; ION BEAMS; MOLECULAR SPECTROSCOPY; MOLYBDENUM; MULTILAYERS; OPTICAL MULTILAYERS; OPTICAL PROPERTIES; REFLECTION; REFRACTIVE INDEX; SCATTERING; SILICON; X RAY OPTICS; X RAY SCATTERING; X RAYS;

CRYSTALLINE STATES; CRYSTALLINE-AMORPHOUS INTERFACES; DENSITY VARIATIONS; DESTRUCTIVE ANALYSIS; DIFFUSE SCATTERINGS; INTERFACIAL LAYERS; LATERAL CORRELATION LENGTHS; MO/SI MULTILAYERS; MULTILAYER SURFACES; OPTICAL PERFORMANCES; PERIODIC MULTILAYERS; ROUGHNESS; SI LAYERS; X-RAY EMISSION; X-RAY REFLECTION; X-RAY REFLECTIVITIES;

AMORPHOUS SILICON;

EID: 58249096350     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2008.12.002     Document Type: Article

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