Interlayer composition in Mo-Si multilayers using X-ray photoelectron spectroscopy

Journal of Electron Spectroscopy and Related Phenomena

Volumn 152, Issue 3, 2006, Pages 115-120

  Nayak, M ^a   Lodha, G S ^a   Nandedkar, R V ^a   Chaudhari, S M ^b   Bhatt, P ^b  

^a RAJA RAMANNA CENTRE FOR ADVANCED TECHNOLOGY   (India)

^b UGC DAE CONSORTIUM FOR SCIENTIFIC RESEARCH   (India)

Author keywords

Interface structure; Interface thermodynamics; Multilayer; X ray photoelectron spectroscopy

Indexed keywords

COMPOSITION; ELECTRON BEAMS; EVAPORATION; INTERFACES (MATERIALS); MOLYBDENUM COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

INTERFACE STRUCTURE; INTERFACE THERMODYNAMICS; MOLYBDENUM-SILICON MULTILAYERS;

MULTILAYERS;

EID: 33745634385     PISSN: 03682048     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elspec.2006.04.005     Document Type: Article

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