A silicon integrated micro nano-positioning XY-stage for nano-manipulation

Journal of Micromechanics and Microengineering

Volumn 18, Issue 12, 2008, Pages

  Sun, Lining ^a   Wang, Jiachou ^a,b   Rong, Weibin ^a   Li, Xinxin ^b   Bao, Haifei ^b  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

^b SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ACTUATORS; AMPLIFICATION; ASPECT RATIO; BRIDGE CIRCUITS; FABRICATION; NATURAL FREQUENCIES; NETWORKS (CIRCUITS); REACTIVE ION ETCHING; SEMICONDUCTING SILICON COMPOUNDS; SENSORS; SILICON WAFERS;

AXIS DISPLACEMENTS; BULK-MICROMACHINING; COMB ACTUATORS; COMPREHENSIVE DESIGNS; DEEP REACTIVE ION ETCHINGS; DISPLACEMENT SENSORS; DRIVING VOLTAGES; MONOLITHIC CHIPS; NANOMETRIC; NOVEL FABRICATION PROCESSES; PIEZORESISTIVE; PIEZORESISTIVE SENSORS; PIEZORESISTOR; PIEZORESISTORS; POSITIONING PRECISIONS; RESONANT FREQUENCIES; SIDE-WALLS; WHEATSTONE BRIDGE CIRCUITS;

NANOSENSORS;

EID: 58149333167     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/18/12/125004     Document Type: Article

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