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Optics Letters

Volumn 33, Issue 24, 2008, Pages 2995-2997

Extreme-ultraviolet microexposure tool at 0.5 NA for sub-16 nm lithography

(4) Goldstein, Michael a Hudyma, Russ b Naulleau, Patrick c Wurm, Stefan a

a SEMATECH (United States)

b Hyperion Development LLC (United States)

c LAWRENCE BERKELEY NATIONAL LABORATORY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

OPTICAL DESIGN; OPTICAL VARIABLES MEASUREMENT;

EXTREME ULTRAVIOLET; LITHOGRAPHIC SIMULATIONS; MICRO-EXPOSURE TOOL; NEXT GENERATION LITHOGRAPHY; PERFORMANCE EXPECTATIONS; PROJECTION OPTICS; RESOLUTION LIMITS; SEMICONDUCTOR PROCESS TECHNOLOGY;

EXPOSURE METERS;

EID: 58149139365 PISSN: 01469592 EISSN: None Source Type: Journal
DOI: 10.1364/OL.33.002995 Document Type: Article

Times cited : (23)

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