Full-chip lithography simulation and design analysis - How OPC is changing IC design

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue I, 2005, Pages 1-14

  Spence, Chris ^a  

^a ADVANCED MICRO DEVICES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER RESOURCES; EDA FRAMEWORK; MODEL-BASED OPC (MB-OPC); PROCESS DEVELOPMENT;

COMPUTATIONAL METHODS; COMPUTER SIMULATION; ENGINEERS; LITHOGRAPHY; PROBLEM SOLVING; TURNAROUND TIME;

INTEGRATED CIRCUITS;

EID: 24644496136     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.608020     Document Type: Conference Paper

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