Modeling and simulations of anisotropic etching of silicon in alkaline solutions with experimental verification

Journal of the Electrochemical Society

Volumn 156, Issue 2, 2009, Pages

  Zhou, Zai Fa ^a   Huang, Qing An ^a   Li, Wei Hua ^a  

^a Southeast University   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ANISOTROPIC ETCHING; ANISOTROPY; ATOMIC PHYSICS; CELLULAR AUTOMATA; ETCHING; EXPERIMENTS; PATTERN RECOGNITION SYSTEMS; REAL TIME SYSTEMS;

ALKALINE SOLUTIONS; CELLULAR AUTOMATON METHODS; CRYSTAL PLANES; ETCH RATES; ETCHING CONDITIONS; EXPERIMENTAL VERIFICATIONS; FITTING PROCEDURES; MODELING AND SIMULATIONS; SILICON ANISOTROPIC ETCHINGS; SILICON CRYSTAL PLANES; SIMULATION RESULTS; SIMULATION SYSTEMS; SURFACE ATOMS;

ATOMS;

EID: 58049132775     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3031485     Document Type: Article

References (39)

1. K. E. Bean, IEEE Trans. Electron Devices, ED-25, 1178 (1978).
2. K. E. Petersen, Proc. IEEE, 70, 420 (1982).
3. M. Madou, Fundamentals of Microfabrication, p. 145, CRC Press, Boca Raton, FL (1997).
4. C. Liu, Foundations of MEMS, p. 326, Prentice Hall, Eaglewood Cliffs, NJ (2006).
5. R. A. Buser and N. F. Rooij, Sens. Actuators, A, 28, 71 (1991).
6. C. H. Sequin, Sens. Actuators, A, 34, 225 (1992).
7. J. S. Danel and G. Delapierre, Sens. Actuators, A, 31, 267 (1992).
8. J. Fruhauf, K. Trautmann, J. Wittig, and D. Zielke, J. Micromech. Microeng., 3, 113 (1993).
9. H. Schroder, E. Obermeier, A. Horn, and G. K. M. Wachutka, J. Microelectromech. Syst., 10, 88 (2001).
10. B. Radjenovic, M. Radmilovic-Radjenovic, and M. Mitric, Appl. Phys. Lett., 89, 213102 (2006).
11. O. Than and S. Buttgenbach, Sens. Actuators, A, 45, 85 (1994).
12. T. Hubbard and E. K. Antonsson, Sens. Mater., 19, 437 (1997).
13. E. van Veenendaal, A. J. Nijdam, J. van Suchtelen, K. Sato, J. G. E. Gardeniers, W. J. P. van Enckevort, and M. Elwenspoek, Sens. Actuators, A, 84, 324 (2000).
14. K. Nishidate, M. Baba, and R. Gayload, Comput. Phys., 12, 88 (1998).
15. Z. Zhu and C. Liu, J. Microelectromech. Syst., 9, 252 (2000).
16. K. Kakinaga, O. Tabata, N. Baba, Y. Isono, and J. G. Korvink, IEEJ Trans. Sens. Micromachines, 124, 7 (2004).
17. H. Camon and Z. Moktadir, Sens. Actuators, A, 46, 27 (1995).
18. H. Camon, Z. Moktadir, and M. Djafari-Rouhan, Mater. Sci. Eng., B, 37, 142 (1996).
19. M. A. Gosalvez, R. M. Nieminen, P. Kilpinen, E. Haimi, and V. Lindroos, Appl. Surf. Sci., 178, 7 (2001).
20. M. A. Gosalvez, A. S. Foster, and R. M. Nieminen, Appl. Surf. Sci., 202, 160 (2002).
21. I. Zubel, J. Electrochem. Soc., 150, C391 (2003).
22. Z. F. Zhou, Q. A. Huang, W. H. Li, and W. Deng, J. Micromech. Microeng., 17, S38 (2007).
23. H. Seidel, L. Cseppregi, A. Heuberger, and H. Baummgartel, J. Electrochem. Soc., 137, 3612 (1990).
24. H. Seidel, L. Cseppregi, A. Heuberger, and H. Baummgartel, J. Electrochem. Soc., 137, 3626 (1990).
25. E. Herr and H. Baltes, in Proceedings of IEEE Transducers '91, p. 807, San Francisco, CA (1991).
26. O. Tabata, R. Asahi, H. Funabashi, and S. Sugiyama, Sens. Actuators, A, 34, 51 (1992).
27. P. Allongue, V. Costa-Kieling, and H. Gerischer, J. Electrochem. Soc., 140, 1009 (1993).
28. M. H. Yun, V. A. Burrows, and M. N. Kozichi, J. Vac. Sci. Technol. B, B16, 2844 (1998).
29. K. Sato, M. Shikida, Y. Matsushima, T. Yamashiro, K. Asaumi, Y. Iriye, and M. Yamamoto, Sens. Actuators, A, 64, 87 (1998).
30. S. S. Tan, R. Boudreau, and M. L. Reed, in Proceedings of IEEE MEMS '01, p. 139, Interlaken, Switzerland (2001).
31. R. A. Wind and M. A. Hines, Surf. Sci., 460, 21 (2000).
32. E. van Veenendaal, K. Sato, M. Shikida, and J. van Suchtelen, Sens. Actuators, A, 93, 219 (2001).
33. I. Zubel, Sens. Actuators, A, 94, 76 (2001).
34. I. Zubel and M. Kramkowska, Sens. Actuators, A, 115, 549 (2004).
35. M. A. Gosalvez, Y. Xing, and K. Sato, J. Microelectromech. Syst., 17, 410 (2008).
36. Y. Xing, M. A. Gosalvez, and K. Sato, New J. Phys., 9, 436 (2007).
37. T. J. Hubbard and E. K. Antonsson, J. Microelectromech. Syst., 3, 19 (1994).
38. R. A. Wind, H. Jones, M. J. Little, and M. A. Hines, J. Phys. Chem. B, 106, 1557 (2002).
39. M. A. Gosalvez, D. Cheng, R. M. Nieminen, and K. Sato, New J. Phys., 8, 269 (2006).