The model of etching of (hkl) planes in monocrystalline silicon

Journal of the Electrochemical Society

Volumn 150, Issue 6, 2003, Pages

  Zubel, Irena ^a  

^a WROCLAW UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; ATOMS; COMPUTER SIMULATION; CRYSTAL LATTICES; ETCHING;

MONOCRYSTALLINE SILICON; SILICON CRYSTAL;

SEMICONDUCTING SILICON;

EID: 0037931982     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1568940     Document Type: Article

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