Measurement of (111) silicon anisotropic etching activation energy

Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 2001, Pages 139-142

  Tan, Songsheng ^a   Boudreau, Robert ^a   Reed, Michael L ^b  

^a Corning Inc ^*  (United States)

^b University of Virginia   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ANISOTROPY; ETCHING; POTASSIUM COMPOUNDS; REACTION KINETICS;

WAGON WHEEL PATTERNS;

SILICON WAFERS;

EID: 0034996867     PISSN: 10846999     EISSN: None     Source Type: Journal    
DOI: 10.1109/MEMSYS.2001.906498     Document Type: Article

References (0)