Influence of deposition temperature on the structure and optical properties of HfO2 thin films

Frontiers of Materials Science in China

Volumn 2, Issue 4, 2008, Pages 381-385

  Ni, Jie ^a   Li, Zheng Cao ^a   Zhang, Zheng Jun ^a  

^a TSINGHUA UNIVERSITY   (China)

Author keywords

Growth temperature; Hafnium oxide (HfO2); Refractive index; Structure; Texture

Indexed keywords

EID: 57849137292     PISSN: 16737377     EISSN: 16737482     Source Type: Journal    
DOI: 10.1007/s11706-008-0066-9     Document Type: Article

References (17)

1. G. D. Wilk R. M. Wallace J. M. H.-k. g. d. C. s. Anthony 2001 and materials properties considerations Journal of Applied Physics 89 10 5243 5275
2. J. Robertson 2006 High dielectric constant gate oxides for metal oxide Si transistors Reports on Progress in Physics 69 2 327 396
3. 2 thin films grown by atomic layer deposition Thin Solid Films 466 1-2 41 47
4. S. Xing N. L. Zhang Z. T. Song 2003 Preparation of hafnium oxide thin film by electron beam evaporation of hafnium incorporating a post-thermal process Microelectronic Engineering 66 1-4 451 456
5. 2 films prepared by ion-assisted electron beam evaporation Applied Surface Science 243 1-4 232 237
6. 2 thin films prepared by electron beam evaporation Applied Surface Science 228 1-4 93 99
7. M. F. Al-Kuhaili S. M. A. Durrani E. E. Khawaja 2004 Characterization of hafnium oxide thin films prepared by electron beam evaporation Journal of Physics D-Applied Physics 37 8 1254 1261
8. 2 films Thin Solid Films 371 1-2 61 65
9. 2 films on Si (100) Surface Science 576 1-3 67 75
10. 2 films on Si (100) grown by atomic-layer deposition Applied Physics Letters 81 3 472 474
11. 2 films on Si(100) Journal of VacuumScience & Technology a-Vacuum Surfaces and Films 20 2 507 512
12. 2 thin films Thin Solid Films 340 1-2 110 116
13. K. Takahashi H. Funakubo S. Hino 2004 Effect of deposition temperature on the characteristics of hafnium oxide films deposited by metalorganic chemical vapor deposition using amide precursor Journal of Materials Research 19 2 584 589
14. 2 on p and n silicon Journal of Applied Physics 96 3 1365 1372
15. K. Kukli J. Aarik T. Uustare 2005 Engineering structure and properties of hafnium oxide films by atomic layer deposition temperature Thin Solid Films 479 1-2 1 11
16. 2 and Si substrates by pulsed-laser deposition Applied Physics Letters 87 24 241504
17. 2 thin films grown by high pressure reactive sputtering Journal of Physics D-Applied Physics 40 17 5256 5265