Study of HfO 2 thin films prepared by electron beam evaporation

Applied Surface Science

Volumn 228, Issue 1-4, 2004, Pages 93-99

  Wang, Yongjin ^a   Lin, Zhilang ^a   Cheng, Xinli ^a   Xiao, Haibo ^a   Zhang, Feng ^a   Zou, Shichang ^a  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

Author keywords

Anti reflection coating; Electron beam evaporation; HfO 2 thin film

Indexed keywords

ANTIREFLECTION COATINGS; ATOMIC FORCE MICROSCOPY; ELECTRON BEAMS; ELLIPSOMETRY; EVAPORATION; MORPHOLOGY; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTRON BEAM EVAPORATION; FRESNEL REFLECTION; HFO2 THIN FILMS; SPECTROSCOPIC ELLIPSOMETRY (SE);

HAFNIUM COMPOUNDS;

EID: 1942517834     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2003.12.028     Document Type: Article

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