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Volumn , Issue , 2008, Pages 506-511

Double patterning technology friendly detailed routing

Author keywords

[No Author keywords available]

Indexed keywords

DECOMPOSABILITY; DESIGN FLOWS; DETAILED ROUTING; DOUBLE PATTERNING; LAYOUT DECOMPOSITIONS; MASS PRODUCTIONS; OVERLAY ERRORS; SPEED-UP; TECHNOLOGY NODES; WIRE LENGTHS;

EID: 57849085250     PISSN: 10923152     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICCAD.2008.4681622     Document Type: Conference Paper
Times cited : (63)

References (17)
  • 2
    • 45449086042 scopus 로고    scopus 로고
    • 22nm halfpitch patterning by cvd spacer self alignment double patterning (sadp)
    • C. Bencher, Y. Chen, H. Dai, W. Montgomery, and L. Hul. 22nm halfpitch patterning by cvd spacer self alignment double patterning (sadp). In Proc. of SPIE, volume 6924, 2008.
    • (2008) Proc. of SPIE , vol.6924
    • Bencher, C.1    Chen, Y.2    Dai, H.3    Montgomery, W.4    Hul, L.5
  • 9
    • 39549114053 scopus 로고    scopus 로고
    • Key Directions and a Roadmap for Electrical Design for Manufacturability
    • A. B. Kahng. Key Directions and a Roadmap for Electrical Design for Manufacturability. In Proc. European Solid-State Circuits Conf. 2007.
    • (2007) Proc. European Solid-State Circuits Conf
    • Kahng, A.B.1
  • 14
    • 45449104989 scopus 로고    scopus 로고
    • Post-decomposition assessment of double patterning layout
    • J. Rubinstein and A. Neureuther. Post-decomposition assessment of double patterning layout. In Proc. of SPIE, volume 6924, 2008.
    • (2008) Proc. of SPIE , vol.6924
    • Rubinstein, J.1    Neureuther, A.2
  • 15
    • 35148852663 scopus 로고    scopus 로고
    • Double Patterning Technology: Process-Window Analysis in a Many-Dimensional Space
    • A. Sezginer and B. Yenikaya. Double Patterning Technology: Process-Window Analysis in a Many-Dimensional Space. In Proc. SPIE 6521. 2007.
    • (2007) Proc. SPIE 6521
    • Sezginer, A.1    Yenikaya, B.2
  • 16
    • 34648862054 scopus 로고    scopus 로고
    • A litho-only approach to double patterning
    • A. Vanleenhove and D. Steenwinckel. A litho-only approach to double patterning. In Proc. of SPIE, volume 6521, 2007.
    • (2007) Proc. of SPIE , vol.6521
    • Vanleenhove, A.1    Steenwinckel, D.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.