New graph bipartizations for double-exposure, bright field alternating phase-shift mask layout

Proceedings of the Asia and South Pacific Design Automation Conference, ASP-DAC

Volumn 2001-January, Issue , 2001, Pages 133-138

  Kahng, A B ^a   Vaya, S ^b   Zelikovsky, A ^c  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b University of California   (United States)

^c GEORGIA STATE UNIVERSITY   (United States)

Author keywords

Circuits; Compaction; Computer industry; Computer science; Documentation; Interference; Phase shifters; Protection; Resists; Very large scale integration

Indexed keywords

ALGORITHMS; COMPACTION; COMPUTER AIDED DESIGN; COMPUTER SCIENCE; DEGREES OF FREEDOM (MECHANICS); MASKS; NETWORKS (CIRCUITS); PHASE SHIFT; PHASE SHIFTERS; PHOTOMASKS; PHOTORESISTS; SYSTEM PROGRAM DOCUMENTATION; VLSI CIRCUITS; WAVE INTERFERENCE;

ALTERNATING PHASE SHIFT MASKS; ALTERNATING PHASE SHIFTING MASK; APPROXIMATION RATIOS; COMPUTER INDUSTRY; NEGATIVE PHOTORESISTS; PROTECTION; RESISTS; TWO DEGREES OF FREEDOM;

GRAPH THEORY;

EID: 84949795280     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ASPDAC.2001.913293     Document Type: Conference Paper

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