Application challenges with double patterning technology (DPT) beyond 45nm

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6349 II, Issue , 2006, Pages

  Park, Jungchul ^a   Hsu, Stephen ^a   Van Den Broeke, Douglas ^a   Chen, J Fung ^a   Dusa, Mircea ^a   Socha, Robert ^a   Finders, Jo ^b   Vleeming, Bert ^b   Van Oosten, Anton ^b   Nikolsky, Peter ^b   Wiaux, Vincent ^c   Hendrickx, Eric ^c   Bekaert, Joost ^c   Vandenberghe, Geert ^c  

^a ASML US Inc   (United States)

^b ASML   (Netherlands)

^c IMEC   (Belgium)

Author keywords

And model based OPC; Coloring line method (CLN); Coloring space method (CSP); DDL; DET; Double exposure technology; Double patterning technology; DPT; Feature stitching; Lithography; Mask error factor; MEF; Such as Double Dipole

Indexed keywords

COMPUTER SIMULATION; MATHEMATICAL MODELS; OPTICAL RESOLVING POWER; PHOTOLITHOGRAPHY;

AND MODEL-BASED OPC; COLORING LINE METHOD (CLN); COLORING SPACE METHOD (CSP); DDL; DOUBLE EXPOSURE TECHNOLOGY (DET); DOUBLE PATTERNING TECHNOLOGY (DPT); FEATURE STITCHING; MASK ERROR FACTOR (MEF); SUCH AS DOUBLE DIPOLE;

IMAGING TECHNIQUES;

EID: 33846591914     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.692921     Document Type: Conference Paper

References (5)

1. 1 Single Damascene Structure at NA=0.75, λ=193nm", SPIE, Vol5754, pp.1508-1518.
2. Stephen D. Hsu, et al., "Double Exposure Techniques for 45nm Node and Beyond", SPIE BACUS Vol. 5992, pp. 557-572, 2005
3. Chang-Moon Lim, "Positive and Negative Double Patterning", SPIE Vol. 6154-37, to be published, 2006.
4. M.A. van den Brink, "Challenges and Opportunities to Keep Lithography Scaling on Track", SPIE Vol. 6349-01, to be published, 2006.
5. Stephen D. Hsu, et al., "Split aware DPT OPC method", patent pending, 2006.