Double patterning technology: Process-window analysis in a many-dimensional space

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6521, Issue , 2007, Pages

  Sezginer, Apo ^a   Yenikaya, Bayram ^a  

^a Invarium Inc   (United States)

Author keywords

Double patterning; DPT; Process window

Indexed keywords

DATA STORAGE EQUIPMENT; ERROR ANALYSIS; ETCHING; GRAPHIC METHODS; IMAGE ANALYSIS; STATISTICAL METHODS; IMAGE RECONSTRUCTION; PATTERN RECOGNITION;

DOUBLE PATTERNING; PATTERNING STEP; PITCH ARRAY; PROCESS-WINDOW; VARIABILITY OF SPACES; PROCESS WINDOWS;

PATTERN RECOGNITION; DATA STORAGE EQUIPMENT;

EID: 35148852663     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711515     Document Type: Conference Paper

References (10)

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