Optimal phase conflict removal for layout of dark field alternating phase shifting masks

Proceedings of the International Symposium on Physical Design

Volumn , Issue , 1999, Pages 121-126

  Berman, Piotr ^a   Kahng, Andrew B ^a   Vidhani, Devendra ^a   Wang, Huijuan ^a   Zelikovskry, Alex ^a  

^a University of California   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; APPROXIMATION THEORY; INTEGRATED CIRCUIT LAYOUT; PHOTOLITHOGRAPHY;

PHASE SHIFT MASKS (PSM);

MASKS;

EID: 0032659284     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1145/299996.300037     Document Type: Article

References (18)