X-ray absorption spectroscopy to probe surface composition and surface deprotection in photoresist films

Langmuir

Volumn 21, Issue 9, 2005, Pages 4007-4015

  Lenhart, Joseph L ^a   Fischer, Daniel A ^b   Sambasivan, Sharadha ^b   Lin, Eric K ^b   Jones, Ronald L ^b   Soles, Christopher L ^b   Wu, Wen Li ^b   Goldfarb, Dario L ^c   Angelopoulos, Marie ^c  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^c IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

NEAR-EDGE X-RAY ABSORPTION FINE STRUCTURE SPECTROSCOPY (NEXAFS); POLYMER FILMS; POLYMER MOLECULES; POST-EXPOSURE BAKE (PEB);

ABSORPTION; CONCENTRATION (PROCESS); INTEGRATED CIRCUITS; MATHEMATICAL MODELS; PHOTORESISTS; PLASTIC FILMS; SURFACE ROUGHNESS; X RAY ANALYSIS;

SURFACE STRUCTURE;

EID: 18544369907     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la047160z     Document Type: Article

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