Self-segregating materials for immersion lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6923, Issue , 2008, Pages

  Sanders, Daniel P ^a   Sundberg, Linda K ^a   Brock, Phillip J ^a   Ito, Hiroshi ^a   Truong, Hoa D ^a   Allen, Robert D ^a   McIntyre, Gregory R ^b   Goldfarb, Dario L ^c  

^a IBM ALMADEN RESEARCH CENTER   (United States)

^b IBM RESEARCH   (United States)

^c IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

Graded topcoat; High index immersion; Immersion lithography; Topcoat; Topcoat free photoresist

Indexed keywords

EID: 57349144370     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772937     Document Type: Conference Paper

References (18)

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