High-refractive-index fluids for the next generation ArF immersion lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6153 I, Issue , 2006, Pages

  Wang, Yong ^a   Miyamatsu, Takashi ^a   Furukawa, Taiichi ^a   Yamada, Kinji ^a   Tominaga, Tetsuo ^a   Makita, Yutaka ^a   Nakagawa, Hiroki ^a   Nakamura, Atsushi ^a   Shima, Motoyuki ^a   Kusumoto, Shiro ^a   Shimokawa, Tsutomu ^a   Hieda, Katsuhiko ^a  

^a JSR CORPORATION   (Japan)

Author keywords

ArF immersion lithography; High refractive index fluid; Photodecomposition; Photoresist defects; UV

Indexed keywords

ARF IMMERSION LITHOGRAPHY; HIGH-REFRACTIVE-INDEX FLUID; PHOTODECOMPOSITION; PHOTORESIST DEFECTS;

FLUIDS; INTERFEROMETRY; IRRADIATION; LASERS; PHOTOLITHOGRAPHY; PHOTORESISTS; ULTRAVIOLET RADIATION;

REFRACTIVE INDEX;

EID: 33745633889     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656022     Document Type: Conference Paper

References (3)

1. th International Symposium, Microlithography, 27 Feb-4 March, [5754-76]
2. th International Symposium, Microlithography, 27 Feb-4 March, [5754-58]
3. th International Symposium, Microlithography, 27 Feb-4 March, [5753-03]