A dive into clear water: Immersion defect capabilities

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6154 I, Issue , 2006, Pages

  Streefkerk, B ^a   Mulkens, J ^a   Moerman, R ^a   Stavenga, M ^a   Hoeven, J V D ^a   Grouwstra, C ^a   Bruls, R ^a   Leenders, M ^a   Wang, S ^a   Dommelen, Y V ^a   Boerema, M ^a   Jansen, H ^a   Cummings, K ^a   Riepen, M ^a   Boom, H ^a   Suddendorf, M ^a   Huisman, P ^a  

^a ASML   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

DENSITY (OPTICAL); DIGITAL WATERMARKING; DROP FORMATION; LEACHING;

IMMERSION DEFECTS; WATER PENETRATION;

OPTICAL SYSTEMS;

EID: 33745589638     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.660376     Document Type: Conference Paper

References (1)

1. Daisuke Kawamura, e.a, "Influence of the Watermark in Immersion Lithography Process", SPIE 2005