Immersion specific defect mechanisms: Findings and recommendations for their control

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6154 I, Issue , 2006, Pages

  Kocsis, Michael ^a,b   Van Heuvel, Dieter Den ^b   Gronheid, Roel ^a   Maenhoudt, Mireille ^a   Vangoidsenhoven, Dizana ^a   Wells, Greg ^a,c   Stepanenko, Nickolay ^a,d   Benndorf, Michael ^e   Kim, Hyun Woo ^a,f   Kishimura, Shinji ^a,g   Ercken, Monique ^a   Van Roey, Frieda ^a   O'Brien, S ^a,c   Fyen, Wim ^a   Foubert, Philippe ^a   Moerman, Richard ^h   Streefkerk, Bob ^h  

^a IMEC   (Belgium)

^b INTEL CORPORATION   (United States)

^c TEXAS INSTRUMENTS   (United States)

^d INFINEON TECHNOLOGIES AG   (Germany)

^e PHILIPS RESEARCH LABORATORIES   (Netherlands)

^f SAMSUNG Electronics   (South Korea)

^g PANASONIC CORPORATION   (Japan)

^h ASML   (Netherlands)

Author keywords

Bubbles; Defects; Immersion; Particle Transport; Wafer Edge Film Peeling; Water Marks

Indexed keywords

BUBBLES (IN FLUIDS); LEACHING; PHOTOLITHOGRAPHY; PHOTORESISTS; SCANNING; THIN FILMS;

BUBBLES; IMMERSION; PARTICLE TRANSPORT; WAFER EDGE FILM PEELING; WATER MARKS;

DEFECTS;

EID: 33745622556     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.660432     Document Type: Conference Paper

References (11)

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