Experimental characterization of the receding meniscus under conditions associated with immersion lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6154 I, Issue , 2006, Pages

  Shedd, Timothy A ^a   Schuetter, Scott D ^a   Nellis, Gregory F ^a   Van Peski, Chris K ^b  

^a University of Wisconsin Madison   (United States)

^b SEMATECH   (United States)

Author keywords

Dynamic contact angle; Film pulling; Immersion lithography; Static contact angle

Indexed keywords

DYNAMIC CONTACT ANGLE; FILM PULLING; IMMERSION LITHOGRAPHY; STATIC CONTACT ANGLE;

MATHEMATICAL MODELS; OPTICAL RESOLVING POWER; OPTICAL SYSTEMS; REFRACTIVE INDEX; SUBSTRATES; WSI CIRCUITS;

PHOTOLITHOGRAPHY;

EID: 33745772794     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.658894     Document Type: Conference Paper

References (7)

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4. H. B. Burnett, "The Effect of Surface Characteristics on Contact Line Motion in Immersion Lithography," M.S. Thesis, University of Wisconsin, Madison, WI. (2005).
5. S.D. Schuetter, T.A. Shedd, K.A. Doxtator, G.F. Nellis, C.K. Van Peski, A. Grenville, S.H. Lin, and D.C. Owe-Yang, "Measurements of the Dynamic Contact Angle for Conditions Relevant to Immersion Lithography," to appear in the J. Microlith. Microfab. (2006).
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7. S.D. Schuetter, T.A. Shedd, K.A. Doxtator, G.F. Nellis, and C.K. Van Peski, "A Correlation for Predicting Film-Pulling Velocity in Immersion Lithography," to appear in the Proceedings of the European Mask and Lithography Conference (2006).