Photosensitivity and line-edge roughness of novel polymer-bound PAG photoresists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6519, Issue PART 1, 2007, Pages

  Lee, Cheng Tsung ^a   Wang, Mingxing ^b   Jarnagin, Nathan D ^b   Gonsalves, Kenneth E ^b   Roberts, Jeanette M ^c   Yueh, Wang ^c   Henderson, Clifford L ^a  

^a Georgia Institute of Technology   (United States)

^b UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE   (United States)

^c INTEL CORPORATION   (United States)

Author keywords

Chemically amplified resist; Electron beam lithography; Line edge roughness; PAG homogeneity; Photosensitivity; Polymer bound PAG resist; Resolution

Indexed keywords

CHEMICALLY AMPLIFIED RESIST; LINE-EDGE ROUGHNESS; PAG HOMOGENEITY; POLYMER-BOUND PAG RESIST;

CONDUCTING POLYMERS; EDGE DETECTION; ELECTRON BEAM LITHOGRAPHY; EXTREME ULTRAVIOLET LITHOGRAPHY; FUNCTIONAL GROUPS; PHOTOSENSITIVITY; SURFACE ROUGHNESS;

PHOTORESISTS;

EID: 35148812686     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.713369     Document Type: Conference Paper

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